专利名称：ABRASIVE PARTICLES, METHOD OF
MANUFACTURING THE ABRASIVEPARTICLES, AND METHOD OF
MANUFACTURING CHEMICAL MECHANICALPOLISHING SLURRY
发明人：Suk Min HONG,Myung Won SUH,Yong Kuk
KIM,Joon Ha HWANG,Jeong Yun KIM,DongHyun KIM
申请号：US12344458申请日：20081227
公开号：US20090193721A1公开日：20090806
摘要：Disclosed are abrasive particles, a method for manufacturing the abrasiveparticles, and a method for manufacturing a Chemical Mechanical Polishing (CMP) slurry.The method for manufacturing abrasive particles for the CMP slurry includes preparing araw material precursor, drying the raw material precursor, and calcining the dried rawmaterial precursor using a calcination furnace where a gas atmosphere having relativelyless oxygen in comparison with an air atmosphere is created.
申请人：Suk Min HONG,Myung Won SUH,Yong Kuk KIM,Joon Ha HWANG,Jeong YunKIM,Dong Hyun KIM
地址：Gyeonggi-do KR,Gyeonggi-do KR,Gyeonggi-do KR,Gyeonggi-do KR,SeoulKR,Gyeonggi-do KR
国籍：KR,KR,KR,KR,KR,KR
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