HOLDING DEVICE FOR A SUBSTRATE

专利名称：HOLDING DEVICE FOR A SUBSTRATE发明人：SCHUBERT, GERHARD,KIRSCHSTEIN, ULF-CARSTEN,RISSE, STEFAN,HARNISCH,GERD,KALKOWSKI, GERHARD,GUYENOT,VOLKER

申请号：EP99963248.2申请日：19991116公开号：EP1050070A3公开日：20020911

摘要：Device for holding a substrate (18) in an exposure apparatus, in which thesubstrate (18) on a in the x - and y - coordinate directions in a plane traveling table (1)and between the table surface (5) and the substrate (18) measure incorporate means foradjusting the distance and to the orientation of the substrate (18) relative to an exposureoptical system (2) are provided, from which a corpuscular radiation at a right angle, of thez - coordinate direction in accordance with, is directed onto the substrate surface,characterized by the,– that on the table (1) in the direction of the exposure opticalsystem (2) and at different distances from the table surface (5) two parallel to the planex, y aligned support plates (3, 16) are provided, of which a first support plate (3) viavibration-damping elements (6) with the table (1) is connected and– the second supportplate (16) via at least one holding device, its holding function of - and can be switched onto the first support plate (3), on which the exposure optical system (2) facing side of thesecond support plate..

申请人：LEICA MICROSYSTEMS LITHOGRAPHY GMBH

地址：Göschwitzer Strasse 25 07745 Jena DE

国籍：DE

代理机构：Reichert, Werner F., Dr.

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