专利名称：Plasma processing apparatus发明人：Qing Qian申请号：US11441290申请日：20060524公开号：US07935186B2公开日：20110503
专利附图：
摘要：A plasma processing apparatus is described and which includes a chamberhaving at least two processing stations which are separated by a wall. At least onechannel is formed in the wall, and wherein the channel has a width to length ratio of lessthan about 1:3.
申请人：Qing Qian
地址：San Jose CA US
国籍：US
代理机构：Nixon Peabody LLP.
代理人：Joseph Bach, Esq.
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