专利名称：Plasma processing apparatus
发明人：Daisuke Hayashi,Shigetoshi Kimura,Nobuhiro
Iwama
申请号：US11203204申请日：20050815
公开号：US20060037702A1公开日：20060223
专利附图：
摘要：A plasma processing apparatus includes a processing chamber having a ceilingand a sidewall, a susceptor, disposed in the processing chamber, for mounting thereon anobject to be processed, a processing gas supply mechanism for supplying a processing
gas through the ceiling to generate a plasma, an exhaust plate that is disposed betweenthe susceptor and the sidewall and has a plurality of holes, a gas exhaust unit for
exhausting a gas from under the susceptor through the exhaust plate, and a fin structurehaving plural fins arranged at regular intervals, which is disposed as protruded from thesidewall, at least, in a region extending from a top end portion of the sidewall to a regionof a same height as that of a mounting surface of the susceptor for mounting the objectthereon.
申请人：Daisuke Hayashi,Shigetoshi Kimura,Nobuhiro Iwama
地址：Nirasaki-shi JP,Nirasaki-shi JP,Beverly MA US
国籍：JP,JP,US
更多信息请下载全文后查看
因篇幅问题不能全部显示，请点此查看更多更全内容