专利名称：Method of manufacturing mask发明人：Doh-Hyoung Lee,Jun Ho Jo申请号：US14021700申请日：20130909公开号：US09457426B2公开日：20161004
专利附图：
摘要：A mask substrate that includes a first area and a second area surrounding thefirst area is provided. Then, a laser beam is irradiated on the mask substrate to at leastpartly remove a material of the second area. After that, a physical force is applied to themask substrate to separate the first area from the mask substrate thereby forming an
opening through the mask substrate.
申请人：Samsung Display Co., Ltd.
地址：Yongin-City, Gyeonggi-Do KR
国籍：KR
代理机构：Knobbe Martens Olson & Bear LLP
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